Dr. Guillermo (Gerry) Nuesca
Education: Ph.D. Chemistry (Univ. of North Texas, Denton, TX, USA)
Albany Nanotech-CNSE, University at Albany-SUNY, 1997-2003.
Research and development of advanced materials for nanotechonology (semiconductor, optoelectronics, and related industries).
Semiconductor device fabrication, Materials and Surface characterization.
My research includes the development of new materials and deposition and characterization processes for thin film technology. My group is currently focused on studying different surface and interfacial phenomena; particularly, we are interested in studying self-organized nanoscale materials, modification and control of surfaces/interfaces and sol-gel derived materials. My students work with various materials for diverse and interdisciplinary applications such as catalysis, sensors, chemical separations, drug-delivery systems. We use various analytical techniques such as FTIR, AFM, SEM, XRF, UV-VIS, TGA, DSC, and other chromatography-based or spectroscopy methods. As a Chemistry educator, I am interested in developing new instructional methods for a more integrative undergraduate advanced laboratory courses.
“Gamma radiation-induced grafting of glycidyl methacrylate (GMA) onto water hyacinth fibers.” Jordan F. Madrid, Guillermo M. Nuesca, Lucille V. Abad. 2012. Accepted for 2013 Publication: Radiation Chemistry and Physics. Available online, Nov. 6, 2012.
“PDDA-Protected Cu/Pd Bimetallic Nanoparticles as Activator in DMAB-based Electroless Copper Deposition.” Joy Damasco, Guillermo M. Nuesca. Submitted for Publication. January 2012.
“Formaldehye-free Electroless Copper Deposition via Cu/Pd Nanoparticles Activation.” Joy Damasco, Guillermo M. Nuesca. Philippine Chemistry Congress. Subic Bay Exhibition and Convention Center. April 2010.
“Electroless Copper Deposition Using Dimethylamineborane and Sodium Hypophosphite as Reducing Agents.” Asia-Pacific Conference on Chemistry Education and 24th Philippine Chemistry Congress Proceedings. Tagbilaran, Bohol: April 2009.
"CVD of ZnS:Mn for Thin-film Electroluminescent Display Applications." A.W. Topol, K.A. Dunn, K.W. Barth, G. Nuesca, B.K. Taylor, K. Dovidenko, A.E. Kaloyeros, R.T. Tuenge, C.N. King. Journal of Materials Research. 19(3):3697-3706 (2004).
"Low-temperature Metalorganic CVD of Al2O3 for Advanced CMOS Gate Dielectric Applications." S. Skordas, F. Papadatos, G. Nuesca, J. Sullivan, E.T. Eisenbraun, A.E. Kaloyeros. Journal of Materials Research. 18(8):1868-1876 (2003).
"Stability of Fluorinated Parylenes to Oxygen Reactive-Ion Etching under Aluminum, Aluminum Oxide, and Tantalum Nitride Overlayers." J. J. Senkevich, B. Wang, J. B. Fortin, M.C. Nielsen, J.F. McDonald, T.-M. Lu, G. Nuesca, G.G. Peterson, S.C. Selbrede, M.T. Weise. Journal of Electronic Materials. 32(9): 925-931 (2003)
"MOCVD of Titanium Oxide for Microelectronics Applications." K.Vydianathan, G. Nuesca, G. Peterson, E.T. Eisenbraun, A. E. Kaloyeros. Journal of Materials Research. 16(6):1838 (2001).
"Interlayer Mediated Epitaxy of Cobalt Silicide on Si(100) from Low Temperature CVD of Cobalt: Formation Mechanisms and Associated Properties." A.R. Londergan, G. Nuesca, C. Goldberg, G. Peterson, B. Arkles, A.E. Kaloyeros, J. Sullivan. Journal of the Electrochemical Society. 148(1):21 (2001).